作者: Krishna K. Uprety , Khushroo H. Lakdawala , Russell Shellenberger , Mahmood Ahmad Ali
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摘要: A method of manufacturing indium tin oxide includes sputtering and from a target onto substrate, the including moving along path over substrate. The may have sheet resistance less than 0.5 Ω/⩾. An film includes: first sputtered layer; second layer on third layer. transparency oxide, flying vehicle transparency.