Heterogeneous reactions in non-isothermal low pressure plasmas: preparative aspects and applications
作者： S. Veprek
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摘要: Non-equilibrium properties of low pressure plasmas open new ways to preparative solid state chemistry since they enable strongly endothermic reactions, as well reactions requiring high activation energies, take place at temperatures. For example, the plasma techniques are now replacing many conventional methods in semiconductor technology such thin film deposition, removal photoresists and etching, significant progress is expected application chemical vapour deposition (CVD). Chemical transport appears be a simple method for investigating behaviour heterogeneous systems, solid/gas, under conditions, promising technique crystal growth. The unique features demonstrated by two examples along with description adequate diagnostic investigations. Several aspects production characterization discussed from chemist's point view. A number systems described illustrate variety syntheses interactions between surfaces.
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