Hydrogen and fluorine profiles in GdF3films measured by sputter‐induced optical emission
作者： I. S. T. Tsong , A. S. Bhalla
DOI: 10.1063/1.90061
关键词:
摘要: The sputter‐induced optical emission technique has been used to study the classical problem of exchange fluorine and hydroxyl ions in a solid. were measured form hydrogen atoms detected by characteristic line at 6563 A while 6902 A. Measurement intensities as function sputtering time produced H F depth profiles GdF3 films.
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