Removable shutter apparatus for a semiconductor process chamber

摘要: The disclosure relates to a removable shutter apparatus for deposition or etching including shuttering mechanism (68, 70, 72) disposed within processing chamber (42) and adapted carry plate (66) between retracted position an extended wherein it is engaged by lifting assembly (56, 57) moved into closing the normal plating aperture (38) as if were substrate (46) be processed. When new product presented processing, will lower back onto its out of way handling operation. Because geometrically similar handled same lift 57), robotic shuttling (53, 51) used transport substrates may periodically remove replace with without shutting down system. An important advantage present invention that closes, thus "shadows", exactly closed during processing.