作者: A Ya Tontegode , E V Rut'kov
DOI: 10.1070/PU1993V036N11ABEH002180
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摘要: Intercalation by atoms (Cs, K, Ba, Pt, Si, C,...) of a monolayer graphite film deposited on metal (Ir, Re,...) is reviewed. Atoms with low ionization potential Ba,...) form the intercalate under layer, whereas high unionization (Pt, thick multilayer film. The intercalation efficiency can be accounted for weak bonding (physisorption) to metal. An mechanism proposed. superefficient diffusion intercalated into metals discussed.