Transmission, reflection and absorption of light incident on metallic hole arrays

摘要: In case of metallic hole arrays we need to establish how structures transmit, reflect and absorb light. We fabricated using a focused ion beam etching system (FBI DB235). The period the array was 430/spl plusmn/5 nm, diameter 250/spl nm thickness silver 180/spl nm. made with relatively large dimensions, 1 mm/sup 2/ so as make measurement reflectivity possible existing facilities. next performed optical measurements find transmittance function incident angle frequency. this way are able build up map dispersion surface plasmon (SP) modes associated enhanced transmission.