Chemical vapour deposition of titanium diboride on metallic substrates
作者： H VANDERVALK , J GRONDEL
DOI: 10.1016/0167-2738(85)90030-X
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摘要: Abstract Coating films of TiB 2 on iron, nickel, alumina, and fused silica substrates are obtained by hydrogen reduction TiCl 4 , BBr 3 in the temperature range between 700 900°C. Deposited films, treated substrate surfaces characterized X-ray diffraction, flourescence, optical microscopy, scanning electron microprobe analysis. The iron nickel suffer from etching boronising. Etching boronising controled composition reactant gas mixture, temperature, pressure reactor.
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