High energy (MeV) ion beam modifications of sputtered MoS2 coatings on sapphire
作者： Rabi S. Bhattacharya , A.K. Rai , A. Erdemir
DOI: 10.1016/0168-583X(91)95705-I
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摘要: The present article reports on the results of our investigations high-energy (MeV) ion irradiation microstructural and tribological properties dc magnetron sputtered MoS2 films. Films thicknesses 500–7500 A were deposited NaCl, Si sapphire substrates subsequently irradiated by 2 MeV Ag+ ions at a dose 5 × 1015 cm−2. Scanning transmission electron microscopy, Rutherford backscattering X-ray diffraction techniques utilized to study structural, morphological compositional changes film due irradiation. friction coefficient sliding life determined pin-on-disc tests. Both as-deposited ion-irradiated films found be amorphous having stoichiometry MoS1.8. low in range 0.03–0.04 was measured for both However, increase more than tenfold compared indicating improved bonding interface.
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