作者: Mikito Ueda , Daigo Susukida , Shoichi Konda , Toshiaki Ohtsuka
DOI: 10.1016/S0257-8972(03)00512-7
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摘要: Abstract For improvement of the oxidation resistance a TiAl alloy under high temperature conditions, aluminum chromium alloys were electroplated on in an AlCl3–NaCl–KCl molten salt containing CrCl2 at 423 K. The deposit −0.1 V vs. Al/Al3+ consists γ-Al8Cr5 single phase, including content 41 at.%. A mixture phase and Al is, however, formed potential from −0.2 to −0.4 V. electrodeposit layer was evaluated by test 1173 K for 24 h. On specimen covered with which deposited V, uniform AlCr2 during thin dense Al2O3. Both Al2O3 layers play role superior protection alloy; therefore, plating reduced oxide thickness 1/40 h that without any plating.