Preparation of clean GaAs(100) studied by synchrotron radiation photoemission

作者: Zhi Liu , Yun Sun , Francisco Machuca , Piero Pianetta , William E. Spicer

DOI: 10.1116/1.1532737

关键词:

摘要: … cleaning steps were performed in an Ar purged glovebox attached to the load lock allowing … vacuum at 500 C. After chemical etching in the solution, elemental As 2 ML, arsenic oxides …

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