Material-specific imaging of nanolayers using extreme ultraviolet coherence tomography

摘要: Scientific and technological progress depend substantially on the ability to image nanoscale. In order investigate complex, functional, nanoscopic structures like, e.g., semiconductor devices, multilayer optics, or stacks of 2D materials, imaging techniques not only have provide images but should also quantitative information. We report material-specific characterization buried with extreme ultraviolet coherence tomography. The method is demonstrated at a laser-driven broadband radiation source, based high-harmonic generation. show that, besides axial resolution, spectral reflectivity all layers in sample can be obtained using algorithmic phase reconstruction. This provides localized, spectroscopic, information sample. applied in, production, lithographic mask inspection, quality control fabrication. Moreover, it paves way for investigation ultrafast effects functional interfaces.