An approach for single crystalline zinc oxide thin films with fine channel mist chemical vapor deposition method
作者： Toshiyuki Kawaharamura , Shizuo Fujita
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摘要: Efforts of fabricating single crystalline ZnO thin films by the mist chemical vapor deposition (CVD) method have been reported in this paper. In our previous research, using water solution zinc acetate as Zn source, we not succeeded obtaining structure under reasonable growth rate. recent attempts here, solvent source (zinc acetate) has changed from to methylacetate. This was greatly effective and successive fabricate high quality at increased As far X-ray diffraction 2θ/ω, ω, in-plane ϕ 2θχ/ϕ scan spectra carefully investigated, it is conclude that could obtained films. The CVD technology features partial pressure oxygen reaction area may lead with low density vacancies. (© 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
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