Development of prototype apparatus for creating ZnO at low temperatures using diethyl zinc and O−plasmas

作者: Haruhiko Himura , Masayoshi Yamamoto , Naruhiro Mizuike , Akira Kiyohara

DOI: 10.7567/JJAP.54.01AA05

关键词: PlasmaZincOxygenNanoparticleAnalytical chemistryRadio frequencyMaterials scienceGeneral EngineeringGeneral Physics and Astronomy

摘要: A new plasma process for fabricating impurity-free zinc oxide films and/or nanoparticles using diethyl (DEZn) and negative oxygen (O−) plasmas at low temperatures has been proposed. To test it experimentally, a prototype apparatus developed. For the O− source, an intermittent discharge with 13.56 MHz radio frequency is employed. As Zn precursor, DEZn successfully transported to reactor chamber without any carrier gas. Initial results obtained developed are also discussed.

参考文章(28)
Yang Guangtao, Zhang Guobin, Zhou Hongjun, Qi Zeming, Synchrotron radiation assistant MOCVD deposition of ZnO films on Si substrate Applied Surface Science. ,vol. 255, pp. 7695- 7699 ,(2009) , 10.1016/J.APSUSC.2009.04.160
Daiyu Hayashi, Kiyoshi Kadota, Efficient Production of O - by Dissociative Attachment of Slow Electrons to Highly Excited Metastable Oxygen Molecules Japanese Journal of Applied Physics. ,vol. 38, pp. 225- 230 ,(1999) , 10.1143/JJAP.38.225
I. Volintiru, M. Creatore, B. J. Kniknie, C. I. M. A. Spee, M. C. M. van de Sanden, Evolution of the electrical and structural properties during the growth of Al doped ZnO films by remote plasma-enhanced metalorganic chemical vapor deposition Journal of Applied Physics. ,vol. 102, pp. 043709- ,(2007) , 10.1063/1.2772569
B. P. Zhang, N. T. Binh, Y. Segawa, K. Wakatsuki, N. Usami, Optical properties of ZnO rods formed by metalorganic chemical vapor deposition Applied Physics Letters. ,vol. 83, pp. 1635- 1637 ,(2003) , 10.1063/1.1605803
P. F. Carcia, R. S. McLean, M. H. Reilly, G. Nunes, Transparent ZnO thin-film transistor fabricated by rf magnetron sputtering Applied Physics Letters. ,vol. 82, pp. 1117- 1119 ,(2003) , 10.1063/1.1553997
Frank T. J. Smith, Metalorganic chemical vapor deposition of oriented ZnO films over large areas Applied Physics Letters. ,vol. 43, pp. 1108- 1110 ,(1983) , 10.1063/1.94243
C. R. Gorla, N. W. Emanetoglu, S. Liang, W. E. Mayo, Y. Lu, M. Wraback, H. Shen, Structural, optical, and surface acoustic wave properties of epitaxial ZnO films grown on (0112) sapphire by metalorganic chemical vapor deposition Journal of Applied Physics. ,vol. 85, pp. 2595- 2602 ,(1999) , 10.1063/1.369577
Tadatsugu Minami, Toshihiro Miyata, Yuusuke Ohtani, Yuu Mochizuki, New Transparent Conducting Al-doped ZnO Film Preparation Techniques for Improving Resistivity Distribution in Magnetron Sputtering Deposition Japanese Journal of Applied Physics. ,vol. 45, pp. L409- L412 ,(2006) , 10.1143/JJAP.45.L409
Srinivasan Guruvenket, Robert A. Sailer, S. Phillip Ahrenkiel, Douglas L. Schulz, Kyle W. Johnson, Atmospheric pressure plasma enhanced chemical vapor deposition of zinc oxide and aluminum zinc oxide Thin Solid Films. ,vol. 548, pp. 210- 219 ,(2013) , 10.1016/J.TSF.2013.09.060
Dachun Zhao, Investigation of optical and electrical properties of ZnO ultrafine particle films prepared by direct current gas discharge activated reactive method Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 12, pp. 2880- 2883 ,(1994) , 10.1116/1.587207