Sputtered Fe1−x(N1−yCy)x films obtained in various (Ar–N2–CH4) reactive plasmas

作者: I. Jouanny , A. Billard , Tran Huu Loi , V. Demange , E. Bauer-Grosse

DOI: 10.1016/J.SURFCOAT.2005.08.075

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摘要: Abstract The Fe 1− x (N y C ) iron carbonitrides commonly encountered with high non-metal content are the e (  = 0.25–0.33) and ζ  = 0.33–0.36) phases whose structures derive from ones existing in binary Fe–N system by substituting N C. As it is possible to synthesize cubic γ″ γ‴ nitrides an atomic nitrogen close 0.5, we study here possibility substitute obtain equiatomic content. films were deposited on copper substrates using a triode sputtering magnetron mode target variable reactive Ar–N 2 and/or –CH 4 mixture. Energy Dispersive X-ray Analysis was used determine their composition. as-sputtered states identified X-Ray Diffraction. being magnetic, propose particular geometry allowing its sputtering. In pure (Ar–N plasma  = 0), increases linearly 0 0.51 flowing rate then stays constant. successive nitrides, e-Fe 3 N, ζ-Fe mixture of can be identified. However, some diffraction peaks remain not indexed previous phases. (Ar–CH  = 1), carbon rapidly 0.62 as function CH while structure changes α-Fe χ-Fe 5 via amorphous compound. plasma, ternary keeping 0.5 various values within range 0–0.46 obtained. crystalline detected Diffraction evolves γ″/γ‴ for  = 0  = 0.41–0.46 passing through ζ/γ‴  = 0.33.

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