Structure sensitivity and photocatalytic reactions of semiconductors. Effect of the last layer atomic arrangement.
作者： Jarod N. Wilson , Hicham Idriss
DOI: 10.1021/JA027155M
关键词:
摘要: … We have successfully decoupled the surface-bulk effects by using a TiO 2 (001) single … ratio of the rate constant of charge transfer (k CT ) to that of both k CT and the rate constant of hole…
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