Hydroxyapatite effect on photopolymerization of self-etching adhesives with different aggressiveness.

摘要: Abstract Objective To understand the correlation of acidic monomer/hydroxyapatite (HAp) reaction with photopolymerization behaviour self-etching adhesives different aggressiveness. Methods Two commercial strong Adper Prompt L-Pop (APLP, pH ∼ 0.8) and mild Easy Bond (AEB, pH ∼ 2.5) were used. HAp powders incorporated into both to acquire solutions concentrations 0, 1, 3, 5, 7 wt%. The attenuated total reflectance Fourier transform infrared (ATR/FT-IR) technique was employed collect in situ spectra during light-curing, from which degree conversion (DC) polymerization rate (PR) calculated. pH each tested solution also measured. Results Without incorporation, DC PR APLP (7.8% 0.12%/s, respectively) much lower than those AEB (85.5% 5.7%/s, respectively). displayed an apparent increasing trend content. For example, increased 7.8% 58.4% 0.12 3.8%/s when content 0 In contrast, less affected by observations correlated well spectral changes, indicated that underwent a higher extent chemical AEB. Conclusions results disclosed important role monomer/HAp improving (low-pH) such as APLP. phenomenon improvement strongly depended on adhesive