作者: Marco Bellini , Bongim Jun , Tianbing Chen , John D. Cressler , Paul W. Marshall
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摘要: X-ray total ionizing dose effects in both fully-depleted and partially-depleted SiGe HBT-on-SOI transistors are investigated at room cryogenic temperatures for the first time. Devices irradiated grounded forward-active mode configurations exhibit a different behavior depending on collector doping of device. The degradation produced by 10 keV x-rays is compared to previously reported 63 MeV proton results same devices, showing decreased irradiation. Both substrate bias shown affect two-dimensional nature current flow these resulting significant differences avalanche multiplication characteristics (hence, breakdown voltage) across temperature