Comparison of nanoscale measurements of strain and stress using electron back scattered diffraction and confocal Raman microscopy

作者: Mark D. Vaudin , Yvonne B. Gerbig , Stephan J. Stranick , Robert F. Cook

DOI: 10.1063/1.3026542

关键词:

摘要: Stresses in Si as small 10 MPa have been measured using electron backscattered diffraction (EBSD) and confocal Raman microscopy (CRM) with spatial resolutions of nm 100 nm, respectively. In both techniques, data were collected across wedge indentations (001) Si. EBSD the stress strain tensors CRM uniaxial stress. The results agreed very well except close to indentation, where surface-sensitive indicated larger stresses. Results converged when laser excitation wavelength was reduced, probing smaller depths. profiles are consistent inverse-square power law predicted by Eshelby analysis.

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