Uniformity improvement in dc magnetron sputtering deposition on a large area substrate

摘要: Abstract Single-substrate transfer type sputtering systems have been used for deposition of electrode films in liquid crystal display (LCD) production process. In on a large area substrate such as 550 mm×650 mm thickness distribution has feature diagonal non-uniformity. The differences electron flow distances from target to anodes are remarkable larger processing system, therefore plasma density race track discharge Electron suppressers consisting electrically floating walls investigated order control local distances. On substrate, film uniformity is improved ±7.0% ±4.4% by use suppressers.