作者: T. Vanhoucke , G.A.M. Hurkx
DOI: 10.1109/BIPOL.2005.1555196
关键词:
摘要: We present a unified electro-thermal criterion for quantifying the stability region of bipolar transistors. The can be used process optimization or circuit design. propose new figure-of-merit as maximum V/sub CE/ at which current peak f/sub T/ applied without runaway.