Vacuum coating system with a coating chamber and at least one source chamber

摘要: The invention relates to a device, in particular for laser-induced vacuum arc discharge evaporator depositing of multiple layers with high level purity and deposition rates on large-area components. According the invention, material source coating is chamber which can be evacuated separated vacuum-tight manner from actual substrate coated located. can, particular, used amorphous carbon are hydrogen-free superhard and/or contain hydrogen, conjunction high-purity metal or reactive plasma-enhanced of, example, oxidic, carbide, nitride hard ceramic combination thereof. corresponding plasma sources flange-mounted any suitable chambers and, consequently, also combined conventional processes, example magnetron sputtering.