Layout processing method for resist top loss technical hotspot of metal layer

作者: Tan Tiequn , Zhao Xuan , Wang Dan , Yu Shirui

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摘要: The invention discloses a layout processing method for resist top loss technical hotspot of metal layer. comprises the steps S1, screening out edge area hotspot, wherein distance between upper and lower is more than or equal to minimum design rule, an through hole layer anda are arranged in area; S2, judging whether both have tangent relationship with layers; if yes, executing step S3; no, S4; S3, separately performing stretching correction action on intersected adjacent edges edge; S4, reverse non-tangent edges. According provided by invention, performed fully using redundant space layer, simulation result that insulating grooves increased, problem about short circuit wire caused can be effectively avoided.

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