Use of n+ spike doping regions as nonequilibrium connectors

作者: P.H. Beton , A.P. Long , N.R. Couch , M.J. Kelly

DOI: 10.1049/EL:19880294

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摘要: Very thin n/sup +/ layers of semiconductor (spike doping) may be used to control the potential difference between microelectronic components while not significantly modifying any nonequilibrium distributions electron energy or momentum across their extent. The authors demonstrate this general principle with example a hot injection Gunn diode. >

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