Microstructure and oxidation-resistance of Ti1 − x − y −zAlxCryYzN layers grown by combined steered-arc/unbalanced-magnetron-sputter deposition
作者： L.A. Donohue , I.J. Smith , W.-D. Münz , I. Petrov , J.E. Greene
DOI: 10.1016/S0257-8972(97)00249-1
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摘要: Abstract Cation-substituted Ti 1 − x y −z Al Cr Y z N alloys, with = 0.03 and 0.02, have been shown to offer greatly enhanced high-temperature oxidation resistance compared presently used TiN films. Layers (3 μm thickness) were deposited by unbalanced magnetron sputter deposition onto austenitic stainless steel M2 high-speed substrates which had ion etched in situ using a steered Cr-metal-ion cathudic arc discharge at an Ar pressure of 6 × 10 −4 mbar (0.45 mTorr). The metal ion-etching promoted initial local epitaxy on individual substrate grains while the overall film texture evolved through competitive growth (111) 0.44 0.53 alloys (200) 0.43 0.52 0.02 N. Although layers exhibited columnar microstructure similar that previously observed addition 2 mol% YN resulted significant grain refinement giving rise more equiaxed structure. Knoop microhardness was HK 0.025 2700 kg mm −2 2400 for onset rapid oxidation, as determined from thermo-gravimetric measurements, ranged ≈ 600 °C 870 0.46 0.54 920 950
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