Effects of electron-beam exposure on a ruthenium nanocluster polymer
作者： M. D. R. Thomas , H. Ahmed , K. M. Sanderson , D. S. Shephard , B. F. G. Johnson
DOI: 10.1063/1.1379780
关键词:
摘要: The properties of the ruthenium nanocluster polymer formula [Ru6C(CO)15P(C6H5)2CCP(C6H5)2]n are studied by atomic-force microscopy, Fourier-transform infrared spectroscopy, and electron microscopy as a function electron-beam exposure. These related to electrical conductivity, which is measured at various temperatures electric fields. A hopping correlation length 240 nm deduced explained on basis formation superclusters in an insulating matrix.
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