System and method to optimize extreme ultraviolet light generation

摘要: Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam can maintain focus target material to generate that gives off light. The and method described herein optimize EUV generation by using closed-loop gradient process track fine-tune in real-time positioning of optical elements determine is focused material. When alignment drive droplet position achieved, optimized.