Vapor deposition apparatus
作者： 伸吾 渡辺 , Yuji Ono , 正浩 小川 , Masahiro Ogawa , Kosuke Hasegawa
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摘要: PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus that can feed of film-forming material generated in generator to head without lowering the temperature vapor.SOLUTION: The 13 performs film forming processing an object G be processed by deposition. is configured such that: chamber 30 where subjected and generation 31 evaporated, are adjacently arranged; exhaust mechanisms 36, 41 which reduce pressure inside units 55-60 into 30, included therein. includes: outlet 80 blows out toward 30; generators 70-72 for evaporating 31; control valves 75-77 controlling supply material; flow passages 81-83, 85 emitting outside 31.
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