Ultra-Thin Silicon Carbon Nitride Film: a Promising Protective Coating for Read/Write Heads in Magnetic Storage Devices
作者： Gao Peng , Xu Jun , Ding Wan-Yu , Dong Chuang
DOI: 10.1088/0256-307X/26/6/065203
关键词:
摘要: Ultra-thin amorphous Si–C–N films, down to 2nm, have been synthesized by MW-ECR, plasma enhanced unbalanced magnetron sputtering. The friction coefficient of the film is only 0.11, determined in dry tests against GCr15 ball at a load 400 mN for 20 min. films exhibit good protection corrosion when they are immersed more severe environment 0.1 mol/L oxalic acid 12 h compared usual conditions (0.05 mol/L, 4 min) used current computer industries. These properties can be attributed smooth, dense and pore free structure film. indicate that present technique may promising protective coating read/write heads other magnetic storage devices.
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