作者: Junji Sakurai
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摘要: A horizontal furnace for processing semiconductor devices having a suspension cantilever which supports workpieces in the tube to achieve particle or dust-free operation while still allowing loading and unloading of be heat-treated. The consists heating chamber, connecting chamber supporting vertically connected each other. chambers correspond an accommodating portion, portion cantilever. is kept at lower temperature than that during heat prevent deformation creeping