Purge tube with floating end cap for loading silicon wafers into a furnace
作者： Kenneth H. Adams
DOI:
关键词:
摘要: A purge tube for protecting a boat(s) of wafers. This does not enter the furnace. floating end cap within moves to substantially seal furance opening during processing. The is withdrawn back closed when wafer into tube.
lens.org 参考文章(13)
Junji Sakurai, Horizontal furnace with a suspension cantilever loading system ,(1985)
John Yakura, Apparatus for making stacked high voltage rectifiers ,(1983)
Andrew F. Wollmann, Cantilever diffusion tube apparatus and method ,(1983)
Roger Leopold Baeten, Richard Ernest Tressler, Joseph Stach, Cantilevered boat-free semiconductor wafer handling system ,(1983)
S Platter, T Henebry, Boat mover for semiconductor fusion process ,(1971)
Masao Yamawaki, Yoshio Oka, Katsuo Aoki, Kunihiko Hara, Osamu Ina, Takao Suzuki, Apparatus for thermal diffusion of semiconductor devices ,(1976)
Jurg Daetwyler, Drying oven including shuttle transporting means ,(1986)
Ryozo Satoh, Seishiro Sato, Takeshi Inoue, Apparatus for thermal treatment of semiconductors ,(1980)
Andrew J. Wollmann, J.S. Whang, Slotted cantilever diffusion tube system and method and apparatus for loading ,(1985)
Joseph L. Lambert, Christopher J. Bayne, Graham E. Collyer, Apparatus for loading magazines into furnaces ,(1983)