Effects of ambient gas on cold atmospheric plasma discharge in the decomposition of trifluoromethane
作者： D. B. Nguyen , W. G. Lee
DOI: 10.1039/C6RA01485B
关键词:
摘要: The effect of dilution gases (He, Ar and N2) on plasma discharge in the decomposition trifluoromethane (CHF3) was investigated dielectric barrier at atmospheric pressure. A comparison among these performed terms active power, apparent power factor, impedance, efficiency for CHF3. He showed most homogeneous stable gases. However, ignited generation streamers discharge, resulting a relatively superior CHF3 decomposition. In addition, due to reactions between O2 N2, N2 as gas had disadvantaging tendency form nitric oxide compounds (harmful compounds). Complete could be under following conditions; dilution, ≥ 40 W, fraction 0.2% total flow rate 1000 ml min−1.
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