Semiconductor fabricating apparatus, method for controlling oxygen concentration within load-lock chamber and method for generating native oxide

作者: Masakazu Shimada

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摘要: A semiconductor fabricating apparatus comprises a reaction tube defining space for heat treating silicon wafer, heater means disposed to extend around the tube, load-lock chamber connected by of gate valve, supply pipe communicating with supplying an inert gas and including oxygen thereto, concentration meter, flow rate adjuster regulator. Based on results detected meter are controlled regulator maintain within at desired value.