Inactive gas introducing facility and inactive gas introducing method
作者： Masahiro Takahara , Toshihito Ueda
DOI:
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摘要: An inactive gas introducing facility includes an device disposed in a support portion supporting container accommodating substrate and configured for to the inside of through feed opening with discharging present outside discharge controller controlling operation device. The is capable varying rate gas. control such that feeding supported portion, increased progressively target rate.
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