Stability of surface reconstructions on silicon during RT deposition of Si submonolayers
作者： A.V. Zotov , S.V. Ryzhkov , V.G. Lifshits
DOI: 10.1016/0039-6028(95)00029-1
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摘要: Abstract Surface reconstruction stability of different surface phases formed by Al and Sb on Si(111) Si(100) surfaces has been studied monitoring the attenuation low-energy electron diffraction normal extra reflections during room temperature deposition Si submonolayers. The variety under consideration extensive information background regarding their atomic structure have enabled us to recognize relationship between structure.
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