Interaction of ethylene with cleaved silicon surface
作者： M. Rahmani , M.-A. Zaïbi , J.-P. Lacharme
DOI: 10.1016/J.VACUUM.2004.12.001
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摘要: Abstract We have investigated the interaction of ethylene with cleaved silicon surface by LEED, AES, EELS and photoemission yield spectroscopy (PYS). The initial reconstruction 2×1 has remained visible at higher doses (⩾1000 L). C2H4 been adsorbed on Si(1 1 1)2×1 molecularly an sticking coefficient S 0 = 2 × 1 - saturation valence band fitted a power law ( E – i ) 2.5 ; 4.45 ± 0.02 eV . proved to be scattering for photo-emitted electrons. This is attributed dipole effect, introduced ethylene, distributed in non-uniform way surface.
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