高温雰囲気下における Pt/Ti 薄膜の動的 In-Situ FE-SEM 観察

作者: Mitsuhiro Wada

DOI: 10.2320/JINSTMET.73.943

关键词:

摘要: In general, when thin films of copper (Cu), as a wiring material, and platinum (Pt) are formed on ceramic metal film, such titanium (Ti), is used the basal layer. Thus, effective strategy to lower resistance material increase size crystal grains. However, after annealing, surface roughness increases, adhesive strength deteriorates, which has undesired result that becomes easily exfoliated. There many reports in these effects attributed recrystallization Pt diffusion Ti. there few observations this phenomenon real time described. present study, we observed cross-sectional structure Pt/Ti-containing film performed dynamic high-temperature in-situ field emission electron gun type-scanning microscope (FE-SEM) analyses. A mechanism explain above proposed. The Pt/Ti was by magnetron sputtering technique onto silicon oxide (SiO2) substrate. Ti were generated continuously single chamber. resulting thicknesses 50 nm 500 for Pt, respectively. each studied with dual-beam focused ion beam (FIB)-SEM milling, while high-angle annular dark-field (HAADF) imaging carried out type-transmission (FE-TEM), microstructure evaluated backscatter diffraction (EBSD). addition, FE-SEM (Quanta-FEG) observe film. After temperature increased from room 1000°C, sample maintained at 1000°C 30 min. During period, reflection electronic (environmental scanning mode (ESEM mode)) obtain images 25 μm×25 μm area. real-time measurement using indicates occurs along grain boundaries We event precipitated Regarding action Ti, heat treatment applied an oxygen atmosphere, following events observed: under spherical nanoparticles diffused through Thereafter, cohered recrystallized grains increased, did not diffuse horizontal direction but began cover top model proposed Hanzawa et al., substrate deteriorates proved be valid study.

参考文章(13)
M. J. Lourenço, J. M. Serra, M. R. Nunes, A. M. Vallêra, C. A. Nieto de Castro, Thin-film characterization for high-temperature applications International Journal of Thermophysics. ,vol. 19, pp. 1253- 1265 ,(1998) , 10.1023/A:1022614431285
Seon Yong Cha, Hee Chul Lee, Won Jae Lee, Ho Gi Kim, Platinum Bottom Electrodes Formed by Electron-Beam Evaporation for High-Dielectric Thin Films Japanese Journal of Applied Physics. ,vol. 34, pp. 5220- 5223 ,(1995) , 10.1143/JJAP.34.5220
H Esch, G Huyberechts, R Mertens, G Maes, J Manca, W De Ceuninck, L De Schepper, The stability of Pt heater and temperature sensing elements for silicon integrated tin oxide gas sensors Sensors and Actuators B-chemical. ,vol. 65, pp. 190- 192 ,(2000) , 10.1016/S0925-4005(99)00301-9
Kazuhiro Ito, Susumu Tsukimoto, Masanori Murakami, Self-Formation of Ti-rich Interfacial Layers in Cu(Ti) Alloy Films Japanese Journal of Applied Physics. ,vol. 46, pp. 1942- 1946 ,(2007) , 10.1143/JJAP.46.1942
Jialiang Zhang, Yoshimichi Nagao, Saburo Kuwano, Yoshinori Ito, Microstructure and Temperature Coefficient of Resistance of Platinum Films Japanese Journal of Applied Physics. ,vol. 36, pp. 834- 839 ,(1997) , 10.1143/JJAP.36.834
Katsuhiro Aoki, Yukio Fukuda, Ken Numata, Akitoshi Nishimura, Effects of Titanium Buffer Layer on Lead-Zirconate-Titanate Crystallization Processes in Sol-Gel Deposition Technique Japanese Journal of Applied Physics. ,vol. 34, pp. 192- 195 ,(1995) , 10.1143/JJAP.34.192
Katsuhiro Aoki, Yukio Fukuda, Ken Numata, Akitoshi Nishimura, Ferroelectric properties of crystalline-oriented lead-zirconate-titanates formed by sol-gel deposition technique Japanese Journal of Applied Physics. ,vol. 34, pp. 746- 751 ,(1995) , 10.1143/JJAP.34.746
Katsuhiro Aoki, Yukio Fukuda, Ken Numata, Akitoshi Nishimura, Electrical Comparison of Sol-Gel Derived Lead-Zirconate-Titanate Capacitors with Ir and Pt Electrodes. Japanese Journal of Applied Physics. ,vol. 34, pp. 5250- 5253 ,(1995) , 10.1143/JJAP.34.5250
E. K. Azarbar, Gwyn Williams, Matthiessen's rule breakdown in some Pt- and Pd-based alloys Physical Review B. ,vol. 14, pp. 3301- 3309 ,(1976) , 10.1103/PHYSREVB.14.3301
K. Sreenivas, Ian Reaney, T. Maeder, N. Setter, C. Jagadish, R. G. Elliman, Investigation of Pt/Ti bilayer metallization on silicon for ferroelectric thin film integration Journal of Applied Physics. ,vol. 75, pp. 232- 239 ,(1994) , 10.1063/1.355889