Microstructure and Temperature Coefficient of Resistance of Platinum Films

摘要: Platinum thin films are prepared on alumina ceramic substrates by rf magnetron sputtering. Microstructure and morphology found to be sensitive the sputtering gases substrate surface conditions. N2-sputtered show better microstructure quality than Ar-sputtered ones for use in forming industrial platinum resistance thermometers (IPRTs). The preferred (111) orientation both as-deposited recrystallized Pt identified using X-ray diffraction analysis. Thin-film fabricated laser beam trimming. values of temperature coefficient (TCR) close desired IPRT specification 3850 ppm/°C increase proportionally film's thickness. dependence TCR various heat treatment conditions is also investigated.