Microstructure of plasma-deposited SiO2/TiO2 optical films
作者： Stéphane Larouche , Hieronim Szymanowski , Jolanta E. Klemberg-Sapieha , Ludvik Martinu , Subhash C. Gujrathi
DOI: 10.1116/1.1763912
关键词:
摘要: SiO2 and TiO2, with their high refractive index contrast, are interesting candidates for the fabrication of graded-index optical filters. In this work, SiO2/TiO2 mixtures were prepared by plasma-enhanced chemical vapor deposition from SiCl4 TiCl4. By controlling gas flow ratio, it is possible to obtain coatings values between 1.48, SiO2, 2.35, an extinction coefficient below 10−4 in visible near-infrared regions. The properties do not respect Bruggeman effective medium approximation that supposes two separate phases. Using a combination x-ray photoelectron spectroscopy, Fourier transform infrared spectrometry, elastic recoil detection, we demonstrate single-phase material. Two phases can develop at certain compositions annealing-induced precipitation.
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