VERTICAL TRANSISTORS HAVING P-TYPE GALLIUM NITRIDE CURRENT BARRIER LAYERS AND METHODS OF FABRICATING THE SAME

作者: Young Do Jeong , Kwan Hyun Lee , Takeya Motonobu

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摘要: A vertical transistor includes a drain electrode disposed on first region of substrate, drift layer second the substrate spaced apart from region, and P-type gallium nitride current barrier layers comprising aperture between layers. channel is semiconductor configured to induce formation two-dimension electron gas adjacent top surface thereof. Metal contact plugs are in source layer. gate insulation sequentially opposite

参考文章(4)
Kazuki Ota, Tatsuo Nakayama, Yasuhiro Okamoto, Hironobu Miyamoto, Takashi Inoue, Yuji Ando, Kazuomi Endo, Semiconductor device and field effect transistor ,(2010)
Christophe Hurni, Ilan Ben-Yaacov, Ramya Yeluri, Umesh K. Mishra, Srabanti Chowdhury, Current aperture vertical electron transistors with ammonia molecular beam epitaxy grown P-type gallium nitride as a current blocking layer ,(2012)
Hirotaka Otake, 浩隆 大嶽, Atsushi Yamaguchi, 敦司 山口, Nitride semiconductor device and method of manufacturing the same ,(2008)
Masaya Okada, Makoto Kiyama, Semiconductor device and method for producing the same ,(2011)