Multiple-Layer Multiple-Patterning Aware Placement Refinement for Mixed-Cell-Height Designs

摘要: Conventional lithography techniques are unable to achieve the resolution required by advance technology nodes. Multiple patterning (MPL) has been introduced as a viable solution. Besides, new standard cell structure with multiple middle-of-line (MOL) layers is adopted improve intra-cell routability. A mixed-cell-height library, consisting of cells single-row and multiple-row heights, also used in designs for power, performance area concerns. As result, it becomes increasingly difficult get feasible placement design where require MPL. In this paper, we present methodology refine given satisfying MPL requirements on much possible, while minimizing total displacement. We introduce concept uncolored group (UCG) facilitate effective removal coloring conflicts. By eliminating UCGs without generating any conflict around them, number effectively reduced local global refinement stages our methodology. report promising experimental results demonstrate efficacy