Effects of normal load on nanotribological properties of sputtered carbon nitride films

摘要: Abstract The nanotribological properties of amorphous carbon nitride (CN x ) films ∼380 nm thickness were investigated, in the normal (contact) load range 2–20 mN, using a Berkovich diamond indenter. CN tested this work grown on Si(100) substrates by reactive sputtering and energetic ion bombardment during deposition (IBD). dependence friction behavior (NL) was investigated terms nanomechanical properties, deformation mode Atomic Force Microscopy (AFM) images scratched surfaces, intensity IBD. In sputtered without IBD, increase caused coefficient to decrease initially minimum value and, subsequently, maximum value, after which, it remained constant. dominant mechanism low-load adhesion, while both adhesion ploughing mechanisms contributed intermediate high-load ranges. Elastic plastic (PD) delamination occurred, depending normal-load On other hand, with high-energy IBD showed load-dependent transition scratch responses. Nanoscratching below 5 mN mainly elastic film, above 10 mixed elastic–plastic identified. Testing under 20 resulted local grooving at film surface; however, situ profiling trace AFM no evidence failure. increased load-carrying capacity, higher hardness response obtained each illustrate films.