A novel monochromator for high heat load synchrotron x‐ray radiation

作者: Ali M. Khounsary

DOI: 10.1063/1.1142732

关键词:

摘要: The high heat load associated with the powerful and concentrated x‐ray beams generated by insertion devices (IDs) at a number of present many future (planned or under construction) synchrotron radiation facilities poses formidable engineering challenge for design monochromators other optical devices. Successful utilization intense from depends critically on development, design, availability elements that provide acceptable performance load. Present can handle, best, levels are an order magnitude lower than those these IDs. monochromator described here, referred to as ‘‘inclined’’ monochromator, solution problem. inclined is different in aspects conventional designs. Its primary differentiating characteristic orientation diffracting planes. In this geometry, crystal surface normal planes make angle close 90°. This leads interesting effects including spreading beam over very large area (effectively reducing incident flux), also rendering much smaller effective slope error. Thus, substantial enhancement realized. preliminary results comparative numerical simulation 5‐kW power undulator A Advanced Photon Source encouraging quantitative estimate expected enhancement.

参考文章(3)
R. K. Smither, G. A. Forster, D. H. Bilderback, M. Bedzyk, K. Finkelstein, C. Henderson, J. White, L. E. Berman, P. Stefan, T. Oversluizen, Liquid gallium cooling of silicon crystals in high intensity photon beams (invited) Review of Scientific Instruments. ,vol. 60, pp. 1486- 1492 ,(1989) , 10.1063/1.1140968
A. M. Khounsary, T. M. Kuzay, P. J. Viccaro, D. M. Mills, R. K. Smither, Thermal And Structural Analyses Of A Synchrotron Radiation X-Ray Monochromator With Liquid Gallium And Water Cooling X-Ray/EUV Optics for Astronomy and Microscopy. ,vol. 1160, pp. 145- 155 ,(1989) , 10.1117/12.962636
Ali M Khounsary, John J Chrzas, Dennis M Mills, P James Viccaro, Performance analysis of high-power synchrotron x-ray monochromators Optical Engineering. ,vol. 29, pp. 1273- 1280 ,(1990) , 10.1117/12.55723