Adsorption on metals and semiconductors: Anderson-Newns and Haldane-Anderson models
作者： S. Yu. Davydov , S. V. Troshin
DOI: 10.1134/S1063783407080318
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摘要: A comparative analysis of the Anderson-Newns and Haldane-Anderson models used for describing adsorption atoms (molecules) on metal semiconductor substrates was carried out. Common features differences between them were revealed. Adsorption a single adatom submonolayer film considered. The effect various channels interaction adatoms their electronic structure work function system discussed.
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