Etching and structure transformations in uncured epoxy resin under rf-plasma and plasma immersion ion implantation
作者： Alexey Kondyurin , Marcela Bilek , None
DOI: 10.1016/J.NIMB.2010.03.014
关键词:
摘要: Uncured epoxy resin was spun onto silicon wafer and treated by plasma immersion ion implantation (PIII) argon ions with energy up to 20 keV. Ellipsometry, FTIR spectroscopy optical microscopy methods were used for analysis. The etching, carbonization, oxidation crosslinking effects observed. curing reactions in modified are observed without a hardening agent. A model of structural transformations under beam irradiation is proposed discussed relation processes space environment.
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