Amorphous silicon technology
作者： A. Madan , P.C. Taylor , P.G. LeComber , Y. Hamakawa , M.J. Thompson
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摘要: The growth methods discussed in this volume include both regular and remote plasma enhanced chemical vapor deposition (PECVD), catalytic CVD (CTLCVD), atmospheric pressure (APCVD), very high frequency (VHCVD) magnetron sputtering. Some of the papers discuss use disilane to increase rates. general questions kinetics film is an important topic discussion volume. Several mechanisms for monitoring lasma diagnostics are also topics discussion.
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