A comparative study of the electrochemical deposition of molybdenum oxides thin films on copper and platinum
作者： Radu Banica , Paul Barvinschi , Nicolae Vaszilcsin , Terezia Nyari
DOI: 10.1016/J.JALLCOM.2008.08.119
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摘要: Abstract Molybdenum oxides thin films electrochemical deposition was performed using solutions of peroxo-polymolybdate at pH 2.3 and ammonium molybdate 5.5 as precursors smooth copper platinum supports. The has been carried out constant potentials in the range −600 to −800 mV vs. Ag/AgCl (sat. KCl). deposited on were then heated 350 450 °C argon. In case from 450 °C, XRD spectra reveal, along with MoO 2 , presence Cu 6 Mo 5 O 18 phase. For prepared subjected same heat treatment, only phase present . Thermogravimetric (TG) analysis samples by scraping away (molybdate precursors) support. Before AFM images as-deposited film reveal a granular morphology, diameters 20–80 nm range.
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