Projection exposure using a projector with highly minute liquid crystal display panels

摘要: Projection lithography using a liquid crystal display panel in place of reticle is expected as low-cost reticleless patterning method. Here, simple but useful new exposure system projector with highly minute crystal display panels proposed. A light source and red, green blue was used as it was, set two commercial macro-lenses attached reduction projection optics. The system was evaluated by printing various patterns. Positive OFPR-800 (Tokyo Ohka Kogyo) used resist. diameter of the field approximately 6 mm. As result, line patterns minimum width 14 μm were clearly resolved. However, noticeable partial unevenness observed for 40 or less. Because applications large widths 100-200 are aimed at hand, not problem, patterns with such sizes sharply homogeneously printed even if they considerably complicated.