Two-layer resist process for printing thick patterns by exploiting a maskless projection exposure system using a liquid-crystal-display panel

作者: Toshiyuki Horiuchi , Hayato Okiyama , Ryuta Sato , Hiroshi Kobayashi

DOI: 10.35848/1347-4065/AB7438

关键词: ResistMaskless lithographyOpticsProjection (set theory)Two layerLiquid-crystal displayMaterials scienceProcess (computing)

摘要:

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