Reactive Ion Etching of Cytop and Investigation of Residual Microstructures
作者： Maryam Khodami , Howard Northfield , Ewa Lisicka-Skrzek , R. Niall Tait , Pierre Berini
DOI: 10.1109/JMEMS.2019.2959262
关键词:
摘要: … the presence of etch residue at the bottom of the channel. … element inside the etched channel is deduced as follows: Ta 29.34 %, C … As our etch trials indicate, residue may form in etched …
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