Effect of single Al2O3 cycle insertion with various positions in SnO2 thin films using atomic layer deposition
作者： Hyunwoo Park , Hyeongsu Choi , Namgue Lee , Chanwon Jung , Yeonsik Choi
DOI: 10.1016/J.CERAMINT.2020.02.047
关键词:
摘要: … We used atomic layer deposition (ALD) to evaluate the effect of single Al 2 O 3 cycle insertion at various locations on SnO 2 and Al-doped SnO 2 thin film transistors (TFTs). The ALD …
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